فتوالستیسیته (کشسان نگاری) جامع برای اندازه گیری تنش باقی مانده غیر مخرب در شیشه

  Integrated photoelasticity for nondestructive residual stress measurement in glass   H. Aben*, L. Ainola, J. Anton Laboratory of Photoelasticity, Institute of Cybernetics, Tallinn Technical University, Akadeemia tee 21, 12618 Tallinn, Estonia Received 30 November 1999; accepted 4 February 2000   Abstract The paper gives a review of integrated photoelasticity and of its application for residual stress measurement in glass. By considering the basic theory of the method, two part ...